Research

Atomospheric Pressure Plasma Jet 

In recent years, as the photoelectric products are widely used in various field, like solar cell, liquid crystal display (LCD) and touch penal, the demanding for transparent conductive thin film soar significantly.

However, there are some problem appeared when producing transparent conductive thin film. First of all, for the standard process, a vacuum environment which is expense is required. On the other hand, Indium Tin Oxide (ITO) is the most popular material for such thin film, but it's price increase rapidly these years.

Our group established our own atomospheric pressure plasma jet (APPJ) to produce transparent conductive thin film with the alternative material Gallium Zinc oxide which can produce transparent conductive thin film with well behavior and low cost.